Optically variable devices publications
The following publications detail the work involved in the development of CSIRO’s optically variable devices.
Lee RA, Diffraction Grating, Australian Patent No. 633862; US Patent No. 5,335,113; European Patent No. EP. 0449 893 B1.
Lee RA, Diffraction Grating and method of Manufacture, US patent no. 5,428,479; Canadian patent no. 2065309; European patent no. EP 0449 893 B1; Australian patent no. 649625; Japanese patent no. 3264491.
Lee RA, Multiple Image Diffractive Device, US patent no. 5909313; US patent no. 6342969; European patent no. 704066; Australian patent no. 698856.
Lee RA, Optical Data Element, US patent no. 5,811,775; European patent no. 693204; Australian patent no. 672491; Taiwan patent no. 162755.
Lee RA, A Diffractive Device, US Patent number 5,825,547; US Patent number 6,088,161; European patent no. 766103; European patent no. 712500; German patent DE 69427308.2-08; Australian patent no. 673100. Pending applications in other jurisdictions.
Lee RA, Diffractive Indicia for a Surface, US patent no. 5,912,767.
Lee RA, Diffractive Structure with Interstitial Elements, US patent no. 6,833,956 and patents / applications in other jurisdictions.
Lee RA and G Quint, A Micrographic Device, Australian patent no. 732931; European Patent Application no. 98946157.9; US patent application no. 09/509649.
Lee RA , An Optical Device and Methods of Manufacture, International patent application no. PCT/AU02/00551; US patent no. 7,182,476.
Lee RA , L McCarthy, et al A method of forming a diffractive authentication device, Australian provisional patent no. 2003 903502.
Lee RA, L McCarthy, et a A method of forming a reflective authentication device, Australian provisional patent no. 2003 903501.
Security Effects Design Manual (2007)
Lee RA, 2007, Optical Identity Security – The Optically Variable Device (OVD) and its application to the protection of proof of Identity Documents (POID) from counterfeiting. Restricted circulation publication produced for the Security Standards Working Group of the Commonwealth Reference Group on Identity Security and distributed to their associated State and Federal Government proof of identity document issuing agencies. Book and samples designed and written by RA Lee and produced with OVD foil samples by the OVD Kinegram company of Switzerland and the Leonhard Kurz group of Germany.
Book Chapters and Invited Overseas Lectures
Lee RA, 2005, Micromanufacturing for document security. In: Micromanufacturing and nanotechnology, Mahlik NP, (ed), Springer Verlag, ISBN-10 3-540 25377-7, ISBN-13 978-3-540-25377-8.
Lee RA, 2004, ‘Micromirror array nanostructures for anti-counterfeiting applications’. Optical Security and Counterfeit Deterrence Techniques, San Jose CA, Jan 2004.
Lee RA, 2001, ‘OVD Microstructures for Direct Printing Applications’. Intergraf International Security Printers Conference, Sorrento, Italy, September 2001.
Lee RA, 2001, ‘Colourtone lithography’. MNE 2001 Conference on Micro and Nano Engineering, Grenoble, France, September 2001
Lee RA, 1999, ‘Microtechnology for anti-counterfeiting’. MNE99 Conference on Micro and Nano-Engineering; Rome, Italy, September 1999.
Lee RA, 1997, ‘A New High Security OVD for Anti-counterfeiting Applications’. 9th Interpol conference on currency counterfeiting, Helsinki, Finland, 1997.
Hegedus ZS, Lee RA, 1996, ‘Diffractive Images and Security’, Proc. of the Workshop “Holography as Realized” Kecskemet, Hungary, June 1996.
Hegedus ZS, Lee RA, 1995, “Rigorous analysis of diffractive structures generated by electron beams”, Proc of the Workshop on Diffractive Optics, Prague, Chech Republic, Aug. 1995
Lee RA, 1994, ‘Electron beam origination of diffractive microstructures for optical anti- counterfeiting applications’. Invited paper; First OSA symposium on optical anti- counterfeiting techniques, Dallas, Texas, USA, October 2-7, 1994.
Lee RA, 1991, ‘The Pixelgram – An application of electron beam lithography for the security printing industry’. Presented at the conference on HolographicOptical Security Systems, The Netherlands Congress Centre, The Hague, The Netherlands, 14-15 March, 1991.
Lee RA, 1998, The optically variable device as an anti-counterfeiting feature. Interpol 75th anniversary publication, pp 98-101, Kensington Publications.
Lee RA, Leech PW, 2007, Optical image formation using surface relief micrographic picture elements, Microelectronic Engineering, 84: 669-672.
Leech PW, Lee RA, 2007, Hot embossing of grating based optically variable images in thermoplastic acrylic lacquer, J Material Science, DOI 10.1007/S10853-00651-1.
Leech PW, Lee RA, 2007, Hot embossing of diffractive optically variable images in biaxially-orientated polypropylene, Microelectronic Engineering, 84: 25-30.
Leech PW, Lee RA, Sexton BA, Fiona Smith F, 2007, Hot embossing of micrographic elements in polypropylene, Microelectronic Engineering 84: 109-113.
Leech P, Lee RA, Davis TJ, 2006, Printing via hot embossing of optically variable images in thermoplastic acrylic lacquer, Microelectronic Engineering, 83: 1961-1965. Lee RA, Leech PW, McCarthy LD, Swiegers GF, 2006, New applications of modulated digital images in document security”, Proc SPIE-IS&T Electronic Imaging, Optical Security and Counterfeit Deterrence Techniques, 6075, 2006
Leech PW, Lee RA, 2006, Optically variable micro-mirror arrays fabricated by graytone lithography”, Microelectronic Engineering 83: 351-356.
Lee RA, Leech PW, 2006, “Optically variable watermark (OVW) microstructures for transparent substrates”, Microelectronic Engineering, 83: 2004-2008.
Lee RA, Leech PW, 2005, “Development of optically variable devices for document security”. Surface coatings Australia 42: No. 8.
McCarthy LD, Lee RA, Swiegers G, 2004, “Modulated digital images for biometric and other security applications”. Proc. SPIE-IS&T Electronic Imaging, SPIE 5310: 103-116.
Lee RA, 2004, “Micromirror array nanostructures for anti-counterfeiting applications”, Proc. SPIE-IS&T Electronic Imaging, SPIE 5310: 350-368.
Lee RA, 2002, Colourtone Lithography, Microelectronic Engineering 61/62: 105-111.
Lee RA, 2000, Microtechnology for anti-counterfeiting, Microelectronic Engineering 53: 513-516.
Lee RA, 1991, The Pixelgram – An application of electron beam lithography for the security printing industry. SPIE vol. 1509, Holographic Optical Security Systems.
Lee RA, Lynch DF, Wilson IJ, 1985, Diffraction patterns of generalized curvilinear diffraction patterns, Optica Acta, 32: 573-593.
Lee RA, 1983, Generalized curvilinear diffraction gratings: I. Image diffraction patterns, Optica Acta, 30: 267-289.
Lee RA, 1983, Generalized curvilinear diffraction gratings: II. Generalized ray equations and caustics, Optica Acta, 30: 291-303.
Lee RA, 1983, Generalized curvilinear diffraction gratings: III. Euclidian diffraction gratings, Optica Acta, 30: 431-439.
Lee RA, 1983, Generalized curvilinear diffraction gratings: IV. Plane Singular Crossed Gratings, Optica Acta, 30: 441-447.
Lee RA, 1983, Generalized curvilinear diffraction gratings : V. Diffraction catastrophes, Optica Acta, 30: 449-464. (1983)